Company Filing History:
Years Active: 2018-2020
Title: Frank Streller: Innovator in Thin Film Metal Silicides
Introduction
Frank Streller is a notable inventor based in Philadelphia, PA (US). He has made significant contributions to the field of materials science, particularly in the development of thin film metal silicides. With a total of 2 patents, his work focuses on enhancing the electronic properties of metal thin films.
Latest Patents
Streller's latest patents include innovative methods for forming thin films that incorporate metal silicides. These patents detail techniques for tailoring the electronic structure of metal thin films to achieve desirable properties. In particular, his work involves the use of platinum silicide, such as PtSi. The methods described include identifying a desired phase of a metal silicide, providing a substrate, and depositing at least two film layers. The first layer consists of amorphous silicon, while the second layer includes metal that contacts the first layer. The process concludes with annealing the two film layers to form a metal silicide. Techniques such as sputter depositing are utilized for the deposition of the film layers.
Career Highlights
Frank Streller is affiliated with the University of Pennsylvania, where he continues to advance research in materials science. His innovative approaches have garnered attention in the academic community and beyond.
Collaborations
Some of his notable coworkers include Robert W Carpick and Rahul Agarwal, who contribute to the collaborative research environment at the University of Pennsylvania.
Conclusion
Frank Streller is a distinguished inventor whose work in thin film metal silicides has the potential to impact various technological applications. His contributions to the field exemplify the importance of innovation in materials science.