Frank R Trueira

Title: Frank R. Trueira: Innovator in Ion Implantation Technology

Introduction

Frank R. Trueira is a notable inventor based in York, Maine, who has made significant contributions to the field of ion implantation technology. With a total of 2 patents to his name, Trueira's work focuses on enhancing the efficiency and precision of ion sources used in various applications.

Latest Patents

Trueira's latest patents include a "Microwave Energized Ion Source for Ion Implantation." This innovative apparatus features a dielectric plasma chamber, a pair of vaporizers, and a microwave tuning and transmission assembly. The design allows for the routing of source material and ionizable gas into the chamber, which is capped with an arc slit for ion exit. The microwave tuning assembly utilizes a coaxial microwave energy transmission line to feed energy into the chamber, ensuring optimal performance. Another significant patent involves a structure for accurately positioning and aligning an extraction member aperture with a predetermined beam line in an ion implantation apparatus. This invention addresses cumulative tolerance errors found in previous designs, enhancing the precision of ion implantation processes.

Career Highlights

Frank R. Trueira is currently employed at Eaton Corporation, where he continues to develop innovative solutions in the field of ion implantation. His expertise and dedication to advancing technology have made him a valuable asset to the company.

Collaborations

Throughout his career, Trueira has collaborated with notable colleagues, including Piero Sferlazzo and Peter H. Rose. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

Frank R. Trueira's contributions to ion implantation technology through his patents and work at Eaton Corporation highlight his role as an influential inventor in the field. His innovative designs continue to pave the way for advancements in ion source technology.