Location History:
- Unterhaching, DE (2004 - 2007)
- Dresden, DE (2006 - 2009)
Company Filing History:
10 out of 14,720 
1 out of 555 
1 out of 832,812 Years Active: 2004-2009
Title: Innovations by Frank-Michael Kamm: A Focus on Lithography
Introduction
Frank-Michael Kamm is a distinguished inventor based in Dresden, Germany. With a robust portfolio of twelve patents, he has contributed significantly to advancements in lithography technology. His work primarily focuses on the development of reflection masks and related systems used in extreme ultraviolet (EUV) lithography.
Latest Patents
Among his latest patents is the innovative reflection mask, designed for lithographically transferring a layout onto a target substrate, particularly applicable in EUV lithography. This reflection mask features a reflective multilayer structure and incorporates a flare reduction layer, which is strategically situated on a bright field of the multilayer configuration. Additionally, Kamm holds a patent for a system that efficiently projects a pattern from a mask onto a substrate. This system includes a radiation source emitting light in the extreme ultraviolet wavelength range, alongside a mask that comprises absorbent and reflective structures. It uses a combination of illumination optical systems and reflective mirrors to accurately focus the patterned light onto the substrate.
Career Highlights
Throughout his career, Frank-Michael Kamm has been associated with renowned companies such as Infineon Technologies AG. His tenure there has allowed him to leverage his expertise in lithography and contribute to the company’s innovation strategies.
Collaborations
Kamm has had the opportunity to collaborate with notable professionals, including Albrecht Ehrmann and Ernst Haugeneder. These partnerships have played a significant role in enhancing his research and development efforts in the field of lithography.
Conclusion
Frank-Michael Kamm's innovations in reflection masks and lithography systems mark him as a key figure in advancing technology in this domain. His contributions not only reflect his expertise but also signify the importance of collaboration in driving innovation forward in the field of enhanced lithographic techniques.