Company Filing History:
Years Active: 2003
Title: Frank Eisenkrämer: Innovator in Thin-Film Technology
Introduction
Frank Eisenkrämer is a notable inventor based in Biebertal, Germany. He has made significant contributions to the field of thin-film technology, holding 2 patents that showcase his innovative spirit and technical expertise.
Latest Patents
Eisenkrämer's latest patents include an absorbent thin-film system consisting of metal and dielectric films. This invention relates to a system made up of alternate metal and dielectric layers, which results in color-neutral absorption in the visual spectral region. The system also provides a defined phase shift and transmission, making it useful for contrasting methods in microscopy. Another significant patent is for an illumination device for a DUV microscope. This device features an illumination beam path from a DUV light source, incorporating a condenser and a reflection filter system that generates a specific DUV wavelength band. The design ensures that the illumination beam is reflected at a consistent angle, allowing for highly corrected DUV objectives.
Career Highlights
Frank Eisenkrämer is currently associated with Leica Microsystems Wetzlar GmbH, a company renowned for its advanced optical systems and microscopy solutions. His work at Leica has allowed him to push the boundaries of microscopy technology through his innovative inventions.
Collaborations
Eisenkrämer has collaborated with notable colleagues, including Lambert Danner and Michael Veith. These partnerships have contributed to the development of cutting-edge technologies in the field of microscopy.
Conclusion
Frank Eisenkrämer's contributions to thin-film technology and microscopy demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of optical systems and their applications in scientific research.