Company Filing History:
Years Active: 2003
Title: Frédéric Gaillard: Innovator in Antireflection Film Technology
Introduction
Frédéric Gaillard is a notable inventor based in Voiron, France. He has made significant contributions to the field of semiconductor technology, particularly in the development of antireflection films. His innovative work has led to the filing of a patent that addresses critical challenges in the industry.
Latest Patents
Frédéric Gaillard holds a patent for a method of forming a silicon oxynitride antireflection film that is noncontaminating with respect to deep-ultraviolet photoresists. This method involves a series of steps, including plasma-enhanced chemical vapor deposition (PECVD) of the antireflection film and treatment with oxygen plasma. The process ensures that each silicon semiconductor substrate introduced into the reactor chamber remains uncontaminated, enhancing the efficiency and reliability of semiconductor manufacturing.
Career Highlights
Frédéric Gaillard is currently employed at France Télécom, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the methods used in the production of silicon-based devices. His dedication to innovation has positioned him as a key figure in his field.
Collaborations
Frédéric collaborates with Patrick Schiavone, working together to push the boundaries of semiconductor technology. Their partnership has fostered an environment of creativity and innovation, leading to advancements in their respective areas of expertise.
Conclusion
Frédéric Gaillard's contributions to the field of semiconductor technology, particularly through his patented method for antireflection films, highlight his role as an influential inventor. His work continues to impact the industry positively, paving the way for future innovations.