Company Filing History:
Years Active: 2019-2021
Title: The Innovative Contributions of Francois P S Luus
Introduction
Francois P S Luus is a notable inventor based in Johannesburg, South Africa. He has made significant contributions to the field of technology, particularly in machine learning and radio frequency interference identification. With a total of 2 patents, Luus continues to push the boundaries of innovation.
Latest Patents
Luus's latest patents include a computer-implemented method and computer system for supervised machine learning. This invention involves applying a dimensional visualization module that incorporates a global objective function to an unsupervised dimension reduction algorithm. The method produces a dimensionally reduced dataset from a dataset containing multiple data points. It also allows for user input to enhance the categorization of data points, resulting in a user-enhanced dimensionally reduced dataset for visual display.
Another significant patent by Luus is a computer-implemented method to identify radio frequency interference (RFI) in a spectrogram. This method divides the spectrogram into multiple blocks and applies various matrix pooling functions to produce summarized pools. It creates line masks for each pool and an RFI mask that indicates the presence of radio frequency interference.
Career Highlights
Francois P S Luus is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to collaborate with other talented individuals in the field, further enhancing his contributions to technology.
Collaborations
Some of Luus's notable coworkers include Melvin Mathew Varughese and Ismail Yunus Akhalwaya. Their collaborative efforts have likely contributed to the innovative projects they have worked on together.
Conclusion
Francois P S Luus is a distinguished inventor whose work in machine learning and radio frequency interference identification showcases his innovative spirit. His contributions continue to impact the technological landscape, and his patents reflect his commitment to advancing the field.
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