Company Filing History:
1 out of 832,880 Years Active: 1991
Title: Franco Gaspari: Innovator in Plasma Etching Technology
Introduction
Franco Gaspari is a notable inventor based in Don Mills, Canada. He has made significant contributions to the field of plasma etching technology, particularly through his innovative methods and apparatus for substrate processing. His work has implications for various industries, including semiconductor manufacturing and materials science.
Latest Patents
Franco Gaspari holds a patent for a "Method and apparatus for the plasma etching, substrate cleaning." This invention provides new methods and apparatus for the deposition of materials on substrates using a D.C. glow discharge, also known as a plasma discharge. The process involves introducing a precursor gas at low pressure into an enclosure containing two spaced parallel cathode electrodes and an intermediate parallel anode electrode. This setup allows for the generation of a deposition plasma, which enhances the quality of films produced at increased deposition rates. The invention addresses several challenges in the prior art processes, including improved film adhesion and greater independence of operational parameters.
Career Highlights
Throughout his career, Franco Gaspari has focused on advancing plasma technology. His innovative approaches have led to more efficient and effective methods for material deposition, which are crucial for the development of high-quality films in various applications. His patent reflects his commitment to improving existing technologies and pushing the boundaries of what is possible in substrate processing.
Collaborations
Franco has collaborated with notable professionals in his field, including Stefan Zukotynski and Romon V Kruzelecky. These collaborations have likely contributed to the refinement and success of his innovative approaches in plasma etching technology.
Conclusion
Franco Gaspari's contributions to plasma etching technology exemplify the impact of innovation in material processing. His patent demonstrates a significant advancement in the field, showcasing his dedication to improving technology for various applications.