Fook Loong Chin

Title: Fook Loong Chin: Innovator in Semiconductor Polishing Technology

Introduction

Fook Loong Chin is a notable inventor based in Orlando, FL (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of polishing apparatuses. His innovative approach has led to the development of a unique polishing head that enhances the efficiency of semiconductor wafer processing.

Latest Patents

Fook Loong Chin holds a patent for a "Polishing head for pressurized delivery of slurry." This invention provides a polishing head designed for use with a polishing apparatus. In one embodiment, the polishing head includes a carrier head assembly and a retaining ring that is positionable adjacent to a polishing pad. The retaining ring is configured to retain a semiconductor wafer and features a slurry conduit that allows for the flow of slurry to the polishing pad. This innovation is crucial for improving the polishing process in semiconductor manufacturing.

Career Highlights

Chin is associated with Agere Systems Inc., a company known for its advancements in semiconductor technology. His work at Agere Systems has allowed him to focus on developing solutions that address the challenges faced in the semiconductor industry. With a total of 1 patent, his contributions are recognized within the field.

Collaborations

Throughout his career, Fook Loong Chin has collaborated with talented professionals, including Arun Kumar Nanda and Frank Miceli. These collaborations have fostered an environment of innovation and have contributed to the success of various projects within the company.

Conclusion

Fook Loong Chin's work in semiconductor polishing technology exemplifies the impact of innovation in the industry. His patent for a polishing head demonstrates his commitment to enhancing manufacturing processes. As technology continues to evolve, inventors like Chin play a vital role in shaping the future of semiconductor applications.