Company Filing History:
Years Active: 1999-2004
Title: Fong M Chang: Innovator in Plasma Technology
Introduction
Fong M Chang is a notable inventor based in Los Gatos, CA (US). He has made significant contributions to the field of plasma technology, holding a total of 7 patents. His work focuses on advanced methods for depositing low dielectric constant films and ensuring reliable electrical connections in modular load systems.
Latest Patents
One of Fong M Chang's latest patents involves the plasma enhanced chemical vapor deposition of a copolymer of parylene N and comonomers with various double bonds. This innovative method and apparatus allow for the deposition of a low dielectric constant film through plasma-assisted copolymerization of p-xylylene and a comonomer. The copolymer film produced has a dielectric constant ranging from about 2.2 to about 2.5. Preferred comonomers for this process include tetravinyltetramethylcyclotetrasiloxane, tetraallyloxysilane, and trivinylmethylsilane, with the copolymer films containing at least 1% by weight of the comonomer.
Another significant patent addresses a wiring arrangement that ensures all-or-none operation of a series of modular load elements. This design routes high and low voltage lines from a power source through opposite nodes positioned at either end of the series of load elements. This arrangement effectively prevents the activation of only a portion of the load elements when electrical connections are not successfully established.
Career Highlights
Fong M Chang is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at this organization has allowed him to further develop his innovative ideas and contribute to advancements in technology.
Collaborations
Throughout his career, Fong M Chang has collaborated with talented individuals such as Yen-Kun Victor Wang and Thanh Ngoc Pham. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.
Conclusion
Fong M Chang's contributions to plasma technology and his innovative patents highlight his role as a significant inventor in the field. His work continues to influence advancements in materials engineering and electrical systems.