Company Filing History:
Years Active: 1982-1987
Title: Ferencz Kertesz: Innovator in Photographic and Electrostatic Materials
Introduction
Ferencz Kertesz is a notable inventor based in Bissendorf, Germany. He has made significant contributions to the field of photographic and electrostatic materials, holding a total of 2 patents. His innovative work has advanced the technology used in various applications, particularly in photography and recording materials.
Latest Patents
Kertesz's latest patents include a coated photographic base material and an electrostatic recording material. The coated photographic base material features a coating whose binder component is predominantly produced from unsaturated compounds. This coating is hardened using energy-supplying radiation, which helps avoid discoloration during wet developing by incorporating specific hydroxyfunctional substances. The electrostatic recording material is created by coating a conducting paper support with a lacquer that contains unsaturated organic compounds and minimal inert solvent. This lacquer is then hardened through radiation exposure, resulting in a dielectric layer that retains charge effectively, even in high humidity conditions.
Career Highlights
Ferencz Kertesz is currently associated with Felix Schoeller GmbH & Co. KG, where he continues to innovate in his field. His work has been instrumental in developing materials that enhance the performance and reliability of photographic and electrostatic applications.
Collaborations
Kertesz has collaborated with notable colleagues, including Reiner Anthonsen and Wieland H Sack. Their combined expertise has contributed to the advancement of technologies in their respective fields.
Conclusion
Ferencz Kertesz is a distinguished inventor whose contributions to photographic and electrostatic materials have made a lasting impact. His innovative patents reflect his commitment to advancing technology in these areas.