Fengzhao Dai

Title: Innovations of Fengzhao Dai in Lithographic Projection Technology.

Introduction

Fengzhao Dai is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of lithographic projection technology. His innovative work focuses on enhancing the precision and efficiency of lithographic projection lenses.

Latest Patents

Fengzhao Dai holds a patent for a "Multi field point aberration parallel metrology device and method for lithographic projection lens." This invention involves a multi-field point aberration parallel detection device designed for lithographic projection lenses. The device utilizes a spatial light modulator arranged on both the object plane and the image plane of the projection lens under test. The object plane spatial light modulator and the image plane spatial light modulator are configured as grating sets, which are conjugate to one another concerning the projection lens. This innovative approach allows for precise measurement of wave aberration at various field points.

Career Highlights

Fengzhao Dai is affiliated with the Chinese Academy of Sciences, where he continues to advance research in optical technologies. His work has garnered attention for its potential applications in improving lithographic processes, which are crucial in semiconductor manufacturing.

Collaborations

Fengzhao Dai collaborates with notable colleagues, including Xiangzhao Wang and Feng Tang. Their combined expertise contributes to the advancement of research in the field of optics and metrology.

Conclusion

Fengzhao Dai's innovative contributions to lithographic projection technology exemplify the importance of precision in modern manufacturing processes. His patent and ongoing research continue to influence the field significantly.