Geneva, IL, United States of America

Feng Tang

USPTO Granted Patents = 4 



Average Co-Inventor Count = 2.2

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2015-2020

Loading Chart...
Loading Chart...
Loading Chart...
4 patents (USPTO):Explore Patents

Title: The Innovations of Feng Tang

Introduction

Feng Tang is a notable inventor based in Geneva, Illinois, known for his contributions to radar technology. With a total of four patents to his name, he has made significant advancements in the field of measurement instruments. His work focuses on enhancing the accuracy and efficiency of level measurement and emulsion detection.

Latest Patents

Feng Tang's latest patents include a "Through air radar level transmitter with radio frequency shielding." This innovative instrument features a housing designed for mounting to a process vessel, incorporating a waveguide for precise level measurement. The control circuit within the housing manages the instrument's operation, while an RF circuit board facilitates the coupling of high-frequency radar signals with the waveguide. Additionally, he developed a "Time domain reflectometry based method for emulsion detection and profiling." This method utilizes a radar transmitter and a probe to sense impedance, generating pulses and receiving reflected signals to profile the content of emulsions effectively.

Career Highlights

Feng Tang is currently employed at Magnetrol International, Inc., where he continues to push the boundaries of radar technology. His work has been instrumental in developing advanced measurement solutions that cater to various industrial applications.

Collaborations

Feng has collaborated with notable colleagues, including Michael D. Flasza and Steven R. Page, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Feng Tang's contributions to radar technology and measurement instruments highlight his role as a leading inventor in his field. His innovative patents and collaborative efforts continue to shape the future of industrial measurement solutions.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…