Shanghai, China

Feijue Liu


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Feijue Liu: Innovator in Semiconductor Technology

Introduction

Feijue Liu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the area of contact alignment in semiconductor devices. His innovative approach has led to the development of a unique method that enhances the precision of semiconductor manufacturing.

Latest Patents

Feijue Liu holds a patent titled "Method of detecting and measuring contact alignment shift relative to gate structures in a semiconductor device." This invention provides a systematic method for detecting and measuring the alignment shift of contacts relative to gate structures. The method involves designing a test model array with various test model regions on a substrate, forming doped well regions, gate structures, and active regions, and scanning the array with an electron-beam inspector to obtain light-dark patterns of the contacts. This process allows for accurate detection and measurement of alignment shifts, which is crucial for the performance of semiconductor devices. He has 1 patent to his name.

Career Highlights

Feijue Liu is associated with Shanghai Huali Microelectronics Corporation, where he applies his expertise in semiconductor technology. His work at the company has been instrumental in advancing the capabilities of semiconductor manufacturing processes. Liu's innovative methods have contributed to the efficiency and accuracy of device fabrication.

Collaborations

Feijue Liu has collaborated with notable colleagues in his field, including Rongwei Fan and Yin Long. These collaborations have fostered a productive environment for innovation and have led to advancements in semiconductor technology.

Conclusion

Feijue Liu's contributions to semiconductor technology through his innovative patent demonstrate his commitment to enhancing manufacturing processes. His work continues to influence the industry, paving the way for future advancements in semiconductor devices.

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