Farrokh “Kia” Omid-Zohoor

Title: **Farrokh “Kia” Omid-Zohoor: Innovator in Integrated Circuit Technology**

Introduction

Farrokh “Kia” Omid-Zohoor is a prominent inventor based in Sunnyvale, CA. He has contributed to the field of integrated circuit technology with a patented innovation that enhances the performance and reliability of field effect transistors (FETs). His work, which focuses on the fabrication methods that improve transistor isolation, is vital in advancing semiconductor technology.

Latest Patents

Kia holds a significant patent for "Trench Isolation of Field Effect Transistors". This patent outlines a method of fabricating an integrated circuit using trenches to isolate FET transistors from one another. The innovation ensures that the transistors' operating characteristics are not compromised by factors such as junction leakage, breakdown, or shorting, especially when a metal silicide is used in the source/drain regions. The process involves carefully forming a silicon wafer with gate electrode materials on an insulating layer while establishing protection against parasitic edge transistors. With features such as etch protective layers and elevated trench structures, Kia's method effectively mitigates junction leakage and enhances overall circuit integrity.

Career Highlights

Currently, Kia is associated with Advanced Micro Devices Corporation (AMD), where he continues to push the boundaries of semiconductor design and manufacturing. His ground-breaking work in refining the isolation techniques of FETs represents a critical step towards more efficient and robust electronic devices.

Collaborations

Throughout his career, Kia has had the privilege of collaborating with talented individuals such as André Stolmeijer and Yowjuang William Liu. These collaborations have likely contributed to the fruitful development of innovative solutions within the realm of microelectronics.

Conclusion

Farrokh “Kia” Omid-Zohoor exemplifies innovation in the semiconductor industry, particularly with his contributions to enhancing the isolation of field effect transistors. His dedication to improving integrated circuit fabrication techniques has the potential to significantly impact the performance of modern electronic devices, making him a notable figure in the field of technology.