Xiamen, China

Fan Zhang


Average Co-Inventor Count = 3.1

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2011-2019

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3 patents (USPTO):Explore Patents

Title: Fan Zhang - Innovator in Dielectric Composition and Touch Panel Technology

Introduction

Fan Zhang is a notable inventor based in Xiamen, China. He has made significant contributions to the fields of dielectric materials and capacitive touch panel technology. With a total of 3 patents to his name, Zhang's work reflects a commitment to advancing electronic components.

Latest Patents

Zhang's latest patents include a dielectric composition and electric components. This invention relates to a dielectric composition that includes barium titanate, strontium titanate, titanium oxide, and bismuth oxide. The composition is defined by specific molar percentages of these materials, ensuring optimal performance in electronic applications.

Another significant patent is the conductor pattern structure of a capacitive touch panel. This invention describes a structure where first-axis and second-axis conductor assemblies are formed on a substrate's surface. The design allows for efficient interaction between the conductor cells, enhancing the functionality of touch panels.

Career Highlights

Throughout his career, Fan Zhang has worked with prominent companies such as TDK Corporation and TPK Touch Solutions (Xiamen) Inc. His experience in these organizations has contributed to his expertise in developing innovative electronic solutions.

Collaborations

Zhang has collaborated with notable professionals in his field, including Ching-Yang Chang and Shun-Ta Chien. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Fan Zhang's contributions to dielectric materials and touch panel technology highlight his role as a leading inventor in the electronics industry. His patents reflect a deep understanding of material science and engineering, paving the way for future advancements in technology.

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