Fan Liang

Title: The Innovative Mind of Fan Liang

Introduction

Fan Liang is a prominent inventor based in Shaanxi, China. He has made significant contributions to the field of communication technology. His innovative approach has led to the development of a unique patent that enhances the efficiency of inter-chip communication.

Latest Patents

Fan Liang holds a patent for a "Method and device for constructing communication topology structure on basis of multiple processing nodes." This invention involves a communication configuration apparatus designed to construct a communication topology structure based on multiple processing nodes. The apparatus is part of a combined processing system that includes an interconnection interface and other processing devices. The communication configuration apparatus collaborates with these devices to execute computing operations as specified by users. Additionally, the system incorporates a storage apparatus that stores data for both the communication configuration apparatus and other processing devices. This technical solution significantly improves the efficiency of inter-chip communication.

Career Highlights

Fan Liang is currently employed at Cambricon (Xi'an) Semiconductor Co., Ltd. His work at this company has allowed him to focus on advancing communication technologies. His innovative contributions have positioned him as a key figure in the semiconductor industry.

Collaborations

Fan Liang has collaborated with notable colleagues, including Lu Chao and Qinglong Chai. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Fan Liang's contributions to communication technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work at Cambricon (Xi'an) Semiconductor Co., Ltd. continues to influence the industry positively.