Denton, TX, United States of America

Fadziso Mantiziba

This inventor holds 1 USPTO granted patent. Top assignee: Zyvex Corporation. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fadziso Mantiziba. Retrieved from https://idiyas.com/inventor/fadziso-mantiziba

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Fadziso Mantiziba: Innovator in Micro-Electronic Device Release Processes

Introduction

Fadziso Mantiziba is a notable inventor based in Denton, TX (US). He has made significant contributions to the field of micro-electronics, particularly with his innovative patent that addresses the challenges associated with releasing micro-electronic devices.

Latest Patents

Fadziso Mantiziba holds a patent for a "Stiction resistant release process." This method involves releasing a micro-electronic device formed over an insulator of a silicon-on-insulator (SOI) substrate. The process includes etching a portion of the insulator to separate the device from the SOI substrate, rinsing the device, exposing it to a micro-sphere solution, and ultimately removing it from the substrate. Additionally, the method may involve using etching plasma to eliminate the micro-sphere solution.

Career Highlights

Fadziso Mantiziba is currently associated with Zyvex Corporation, where he continues to work on advancements in micro-electronic technologies. His expertise in the field has positioned him as a valuable asset to the company and the industry at large.

Collaborations

Fadziso has collaborated with notable colleagues, including Igor Gory and Bruce E Gnade. These partnerships have likely contributed to the innovative developments in his work.

Conclusion

Fadziso Mantiziba's contributions to micro-electronic device technology through his patented release process exemplify his commitment to innovation. His work continues to influence the field and showcases the importance of advancements in micro-electronics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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