Company Filing History:
Years Active: 2011
Title: The Innovations of Fa-Cheng Wang
Introduction
Fa-Cheng Wang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of lithography through his innovative designs. His work has been recognized for its technical merit and practical applications in the industry.
Latest Patents
Fa-Cheng Wang holds a patent for an "Alignment mark of mask." This patent describes a lithography mask that includes an alignment mark, featuring a first bar and a second bar that crosses the first bar. The design incorporates a specific pattern with different signatures, connecting the first and second bars to the second bar. This innovation enhances the precision of lithographic processes.
Career Highlights
Wang is currently employed at Visera Technologies Company Limited, where he continues to develop cutting-edge technologies. His expertise in lithography has positioned him as a key player in the advancement of semiconductor manufacturing.
Collaborations
Throughout his career, Fa-Cheng Wang has collaborated with talented individuals such as Chih-Shen Fan and Li-Wei Chen. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Fa-Cheng Wang's contributions to lithography and his innovative patent demonstrate his commitment to advancing technology in the semiconductor industry. His work continues to influence the field and inspire future innovations.