Location History:
- Birsfelden, CH (1976 - 1979)
- Rheinfelden, CH (1980 - 1992)
Company Filing History:
Years Active: 1976-1992
Title: Ewald Losert: Innovator in Photoresist Technology
Introduction
Ewald Losert is a notable inventor based in Rheinfelden, Switzerland. He has made significant contributions to the field of photoresist compositions, holding a total of 11 patents. His work has been instrumental in advancing technologies used in printing plates and printed circuits.
Latest Patents
Losert's latest patents focus on positive-working photoresist compositions. One of his key innovations involves a process for the production of images after electrodeposition of positive photoresist onto a substrate. This process includes exposing the photoresist to actinic radiation in a predetermined pattern, followed by the removal of exposed areas using a developer. When applied to metal-faced laminates, the exposed metal surface can be etched, and the residual electrodeposited layer can be removed with a suitable solvent. His suitable electrodepositable positive photoresists include o-nitrocarbinol esters, o-nitrophenyl acetals, and quinone diazide sulphonyl esters of phenolic novolaks, which contain salt-forming groups such as carboxylic acid and amine groups. This innovative process is particularly beneficial for creating printing plates and printed circuits, especially those with conductive links through metal-lined holes.
Career Highlights
Ewald Losert has had a distinguished career, primarily working with Ciba-Geigy Corporation. His expertise in photoresist technology has positioned him as a leading figure in the industry. His contributions have not only advanced the field but have also paved the way for new applications in electronics and printing technologies.
Collaborations
Throughout his career, Losert has collaborated with notable colleagues, including George E Green and John G Paul. These partnerships have fostered innovation and have been crucial in the development of new technologies in the field.
Conclusion
Ewald Losert's work in photoresist compositions has significantly impacted the technology used in printing and electronics. His innovative processes and collaborations continue to influence the industry, showcasing the importance of his contributions.