Company Filing History:
Years Active: 1998-2000
Title: The Innovations of Evelyn Chin
Introduction
Evelyn Chin is a notable inventor based in Scotch Plains, NJ (US). She has made significant contributions to the field of materials science, particularly in the development of photoacid generators. With a total of 2 patents, her work has implications for various applications in chemically amplified resists.
Latest Patents
Evelyn Chin's latest patents focus on processes using photosensitive materials, including a nitro benzyl ester. These patents disclose photoacid generators that are advantageous for use in applications such as chemically amplified resists. The compounds she has developed are based on an ortho nitro benzyl configuration, employing an .alpha. substituent that possesses high bulk, steric characteristics, and electron-withdrawing ability. The enhanced efficacy of these compounds is particularly notable in those that have a suitable .alpha. substituent along with a second ortho substituent that exhibits large electron-withdrawing and steric effects.
Career Highlights
Evelyn Chin is currently associated with Lucent Technologies Inc., where she continues to innovate and contribute to her field. Her work has garnered attention for its potential applications in advanced materials and technology.
Collaborations
Evelyn has collaborated with notable colleagues such as Francis Michael Houlihan and Omkaram Nalamasu, further enhancing her research and development efforts.
Conclusion
Evelyn Chin's contributions to the field of materials science through her patents and collaborations highlight her role as a leading inventor. Her innovative work continues to influence advancements in technology and materials.