Evan Basnaw

Title: Innovations by Evan Basnaw in Position Detection Technology.

Introduction

Evan Basnaw is an inventive mind based in Belleville, MI (US). He has made significant contributions to the field of mechanical influence detection through his innovative patent. His work focuses on enhancing the precision and reliability of machining processes.

Latest Patents

Evan Basnaw holds a patent for a "System and method for detecting position loss in an object under a mechanical influence." This system is designed to be placed upon a target object and a machining tool. It comprises a variety of sensors that detect adverse relative movement and position loss of the target object as it is affected by the machining tool. The system includes portable sensors that communicate with a printed control board, which is configured to relay position data to a remote computing device. This device processes the position data and presents the output on a display. The system can identify position, kinematic, and mechanical issues during the machining process by comparing the position data to predefined thresholds, including position loss, and can automatically adjust the operation of the machining tool accordingly. Evan has 1 patent to his name.

Career Highlights

Evan Basnaw is currently employed at Woolf Aircraft Products, Inc., where he applies his expertise in mechanical systems and sensor technology. His innovative approach has contributed to advancements in the field, particularly in improving machining accuracy and efficiency.

Collaborations

Evan collaborates with Donald R Hall, leveraging their combined expertise to drive innovation within their projects.

Conclusion

Evan Basnaw's contributions to position detection technology exemplify the impact of innovative thinking in the machining industry. His patent reflects a commitment to enhancing operational efficiency and precision in mechanical processes.