Company Filing History:
Years Active: 1983-1998
Title: The Innovative Mind of Eva-Maria Rissel
Introduction
Eva-Maria Rissel, an accomplished inventor based in Forchheim, Germany, has made significant contributions to the field of resist materials and manufacturing methods. With two patents to her name, she has demonstrated a profound understanding of materials science and engineering. Her inventions are particularly focused on enhancing the sensitivity and resolution of positive resist structures used in various applications.
Latest Patents
One of Rissel’s latest patents is titled "Dry-developable positive resist - Method for the manufacture of resist structures." This innovative invention addresses the challenge of creating positive resist structures using short-wave UV rays. The objective of her approach is to achieve increased sensitivity, resolution, high thermal stability, and transparency in the wavelength range above 260 nanometers. The patent proposes using copolymers composed of 1 to 70 mol % alkylmethacrylate and 99 to 30 mol % of an ethylenically unsaturated monomer with chlorine and/or cyan substituents as the resist material. This method is optimized for producing resist structures that are about 0.5 to 2 micrometers thick, employing UV rays in the wavelength range of approximately 180 to 260 nanometers.
Career Highlights
Eva-Maria Rissel is currently employed at Siemens Aktiengesellschaft, a prominent global technology company. Her role has allowed her to contribute to advanced research and development projects within the industry, focusing on innovative solutions that meet emerging technological demands.
Collaborations
Throughout her career, Rissel has collaborated with esteemed colleagues, including Siegfried Birkle and Roland Rubner. These partnerships have facilitated the exchange of ideas and expertise, fostering an environment conducive to innovation.
Conclusion
Eva-Maria Rissel stands out as a dedicated inventor whose work in resist materials continues to influence the field of manufacturing. Her latest patent demonstrates her commitment to advancing technology and offers valuable insights into the development of high-performance materials. As she continues her work at Siemens Aktiengesellschaft and collaborates with fellow innovators, Rissel undoubtedly plays a vital role in shaping the future of materials science.