Seongnam-si, South Korea

Eun Kee Hong


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Eun Kee Hong: Innovator in Thin Film Technology

Introduction

Eun Kee Hong is a notable inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of thin film technology, particularly through his innovative methods of depositing silicon germanium oxide thin films. His work is characterized by a focus on enhancing the efficiency and effectiveness of thin film deposition processes.

Latest Patents

Eun Kee Hong holds a patent for a method of depositing thin film. This method involves forming a silicon germanium oxide thin film on a substrate using an atomic layer deposition (ALD) process. The process consists of at least one cycle that includes a germanium oxide deposition sub-cycle and a silicon oxide deposition sub-cycle. The germanium oxide deposition sub-cycle entails contacting the substrate with a germanium reactant, removing excess germanium reactant, and then contacting the substrate with a first oxygen reactant. Similarly, the silicon oxide deposition sub-cycle involves contacting the substrate with a silicon reactant, removing excess silicon reactant, and contacting the substrate with a second oxygen reactant. The films produced through this method exhibit desirable etch rates relative to thermal oxide, which can vary based on the films' composition.

Career Highlights

Eun Kee Hong is currently associated with Asm IP Holding B.V., where he continues to advance his research and development in thin film technologies. His expertise in atomic layer deposition processes has positioned him as a key player in the field.

Collaborations

Eun Kee Hong has collaborated with notable colleagues, including In Soo Jung and Seung Woo Choi. Their combined efforts contribute to the innovative advancements in thin film technology.

Conclusion

Eun Kee Hong's contributions to the field of thin film technology through his patented methods demonstrate his commitment to innovation. His work not only enhances the understanding of thin film deposition processes but also paves the way for future advancements in the industry.

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