Eun Jung Lee

Title: Eun Jung Lee: Innovator in Substrate Treatment Technology

Introduction

Eun Jung Lee is a prominent inventor based in Cheonan-si, South Korea. She has made significant contributions to the field of substrate treatment technology. Her innovative work has led to the development of a unique apparatus designed to enhance the efficiency of substrate processing.

Latest Patents

Eun Jung Lee holds a patent for an "Apparatus and method for treating substrate." This inventive concept provides a substrate treating apparatus that includes a liquid treating chamber. The apparatus features a support configured to hold a substrate within the liquid treating chamber. It also includes a first treating liquid supply unit that supplies a first treating liquid to the chamber for substrate treatment. Additionally, a second treating liquid supply unit is incorporated, which supplies a second treating liquid to the chamber, and this unit includes a cooler for cooling the second treating liquid. This innovative design aims to improve the substrate treatment process.

Career Highlights

Eun Jung Lee is associated with Semes Co., Ltd., where she continues to work on advancing substrate treatment technologies. Her expertise and innovative mindset have positioned her as a key player in her field.

Collaborations

Eun Jung Lee collaborates with talented coworkers, including Jun Young Choi and Gui Su Park. Their combined efforts contribute to the ongoing development of cutting-edge technologies in substrate treatment.

Conclusion

Eun Jung Lee's contributions to substrate treatment technology exemplify her innovative spirit and dedication to advancing her field. Her patent and work at Semes Co., Ltd. highlight her role as a significant inventor in the industry.