Etsuo Okaue is a notable inventor based in Suwa, Japan. He has made significant contributions to the field of protective film technology, holding a total of 5 patents. His work focuses on enhancing the durability and functionality of recording mediums.

Latest Patents

Okaue's latest patents include innovative solutions such as a protecting film designed for safeguarding the image on recording media. This film comprises a support, a first protective layer made of thermoplastic resin, and a second protective layer laminated on the first. An image is formed on the recording face through a thermal transfer type overcoat process. Another notable patent is for a polarizer plate that features an anti-stain layer. This polarizer plate includes a substrate formed of a polarizer layer and supporting layers, along with an undercoat layer and an anti-reflection layer. The anti-staining layer, which contains a fluorine-based silane compound, enhances the plate's durability and performance.

Career Highlights

Etsuo Okaue is currently employed at Seiko Epson Corporation, where he continues to innovate in the field of imaging technology. His work has been instrumental in developing products that improve the quality and longevity of recorded materials.

Collaborations

Okaue has collaborated with talented coworkers such as Mikito Nakajima and Satoshi Kubota. Their combined expertise has contributed to the successful development of various technologies in their field.

Conclusion

Etsuo Okaue's contributions to protective film technology and his innovative patents reflect his dedication to advancing the industry. His work at Seiko Epson Corporation continues to influence the future of imaging solutions.

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