Stade, Germany

Ernst-Peter Ragosche


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Inventor Profile: Ernst-Peter Ragosche

Introduction

Ernst-Peter Ragosche is a notable inventor based in Stade, Germany. With a focus on enhancing electronic circuit arrangements, he has made significant contributions to the field of semiconductor technology. His innovative approaches aim to optimize the control methods of transistors, particularly through improved resistance management.

Latest Patents

Ragosche holds one patent titled "Circuit arrangement and transistor control method." This invention addresses the complexities associated with controlling the resistance values of MOS transistors. The patent proposes a method that enables compensation for resistance variations, eliminating control deviations even when operating with vanishing DC voltage. By incorporating multiple reference elements, the invention creates an optimal operating point through arithmetic averaging of different offsets.

Career Highlights

Ernst-Peter Ragosche is affiliated with NXP B.V., a leading global semiconductor company. His work has focused on developing advanced circuit technologies that pave the way for improvements in various electronic applications. His expertise in transistor control methods reflects his commitment to innovation and excellence in engineering.

Collaborations

Throughout his career, Ragosche has collaborated with fellow colleagues such as Joachim C. Brilka and Axel Kattner. These collaborations have likely facilitated cross-pollination of ideas and enhanced research efforts, contributing to advancements in their shared field of expertise.

Conclusion

As an inventor, Ernst-Peter Ragosche continues to push the boundaries of technology through innovative circuit arrangements and control methods. His work not only serves to enhance transistor functionality but also contributes to the broader advancements in semiconductor technology. With ongoing developments and collaborations, Ragosche remains a key figure in the field, inspiring future innovations.

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