Chester, NJ, United States of America

Eric W Seelig


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Inventor Spotlight: Eric W. Seelig

Introduction: Eric W. Seelig, a prominent inventor based in Chester, NJ, has made significant contributions to the field of thin film technology. With a keen focus on enhancing dielectric properties, Seelig holds a patent that reflects his innovative approach to material science.

Latest Patents: Seelig's noteworthy patent titled "Method for making thin film tantalum oxide layers with enhanced dielectric constant" highlights a breakthrough in creating tantalum oxide films. The method innovatively involves sputtering Ta2O5 in an oxygen-rich environment at elevated temperatures, exceeding 450°C, and optimally over 550°C. This process resulted in the development of a new crystalline phase thin film with improved dielectric properties, making it valuable in various technological applications.

Career Highlights: Eric W. Seelig has been associated with Lucent Technologies Inc., a leading company in telecommunications and technology. His work has not only showcased his expertise but has also contributed to the advancement of materials used in electronic devices.

Collaborations: In his journey, Seelig has collaborated with esteemed colleagues, including Robert J. Cava and Shang Y. Hou. Their combined efforts have fostered innovation, pushing the boundaries of research in materials science.

Conclusion: Eric W. Seelig's contributions to the realm of thin film technology showcase the spirit of innovation that drives progress in the field. His patented method for creating tantalum oxide layers with enhanced properties stands as a testament to his expertise and dedication to advancing technology in meaningful ways.

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