Location History:
- Beaverton, OR (US) (2001)
- Essex Junction, VT (US) (2002 - 2004)
Company Filing History:
Years Active: 2001-2004
Title: The Innovative Contributions of Eric Seung Lee
Introduction
Eric Seung Lee is a notable inventor based in Essex Junction, Vermont, who has made significant contributions to the field of technology. He holds a total of 4 patents, showcasing his expertise and innovative spirit. His work primarily focuses on advancements in etching methods and materials used in semiconductor manufacturing.
Latest Patents
One of Eric's latest patents is the "Dual Layer Etch Stop Barrier." This invention provides a method for reactive ion etching of silicon oxide (SiO) and introduces an etch stop barrier designed for such etching processes. The patent details a silicon nitride (SiN) barrier with a silicon to nitrogen ratio (x:y) of less than about 0.8, which offers excellent resilience to positive mobile ion contamination, albeit with poor etch selectivity. Conversely, a silicon nitride barrier with a ratio of 1.0 or greater demonstrates excellent etch selectivity with respect to SiO but lacks a barrier against positive mobile ion contamination. The invention describes a barrier formed on a doped silicon substrate, consisting of two sections: one with greater etch selectivity and the other with enhanced resistance to positive mobile ions. The two sections are designed to be between 50 to 100 nanometers thick, optimizing performance in semiconductor applications.
Career Highlights
Eric Seung Lee is currently employed at the International Business Machines Corporation (IBM), where he continues to innovate and contribute to the field of technology. His work at IBM has allowed him to collaborate with other talented professionals and further his research in semiconductor technologies.
Collaborations
Throughout his career, Eric has worked alongside esteemed colleagues such as Chung H Lam and Francis Roger White. These collaborations have enriched his research and contributed to the development of groundbreaking technologies.
Conclusion
Eric Seung Lee's contributions to the field of technology, particularly in semiconductor manufacturing, highlight his innovative spirit and dedication to advancing the industry. His patents, including the Dual Layer Etch Stop Barrier, reflect his expertise and commitment to solving complex challenges in technology.