Company Filing History:
Years Active: 1999-2003
Title: Eric Lavallee: Innovator in Lithography Technologies
Introduction
Eric Lavallee is a notable inventor based in Sherbrooke, Canada. He has made significant contributions to the field of lithography, particularly in the development of advanced methods for fabricating masks used in extreme ultra-violet and deep ultra-violet lithography. With a total of 3 patents to his name, Lavallee's work has had a profound impact on semiconductor manufacturing processes.
Latest Patents
One of Lavallee's latest patents is a method using sub-micron silicide structures formed by direct-write electron beam lithography for fabricating masks for extreme ultra-violet and deep ultra-violet lithography. This innovative approach involves depositing layers of materials that are opaque to deep ultra-violet radiation and absorbent to extreme ultra-violet radiation on a transparent substrate. A focused electron beam is then used to create a structure of etch-resistant metal/silicon compound, which is essential for producing high-quality masks.
Another significant patent focuses on the fabrication of sub-micron etch-resistant metal/semiconductor structures using resistless electron beam lithography. This method allows for the creation of etch-resistant metal/semiconductor compounds by locally heating a layer of metal on a semiconductor substrate. The process results in a durable structure that is crucial for advanced semiconductor applications.
Career Highlights
Throughout his career, Eric Lavallee has worked with esteemed institutions such as Université de Sherbrooke and Quantiscript, Inc. His expertise in lithography and semiconductor technologies has positioned him as a key figure in the field. His innovative methods have contributed to advancements in manufacturing processes that are vital for the electronics industry.
Collaborations
Lavallee has collaborated with notable colleagues, including Jacques Beauvais and Dominique Drouin. These partnerships have fostered a collaborative environment that has led to the development of cutting-edge technologies in lithography.
Conclusion
Eric Lavallee's contributions to the field of lithography exemplify the spirit of innovation and dedication to advancing technology. His patents and career achievements highlight his role as a significant inventor in the semiconductor industry.