Eric L Raab

Title: Eric L. Raab – Innovator in Optical Lithography

Introduction

Eric L. Raab, an accomplished inventor based in Teaneck, NJ, has made significant contributions to the field of optical lithography. With a total of one patent to his name, Raab has demonstrated his expertise in developing technology that plays an essential role in the semiconductor industry.

Latest Patents

Raab's patent, titled "Optical lithographical imaging system including optical transmission," outlines an innovative approach for printing features of a patterned mask onto a workpiece, such as a semiconductor device. This patent describes a unique optical lithographical system that integrates a one- or two-dimensional optical transmission phase-shift diffracting device positioned between an optical condenser and the patterned mask. The diffracting device allows for enhanced collection of diffraction patterns and enables tailored illumination based on the features of the mask.

Career Highlights

Throughout his career, Eric L. Raab has been associated with AT&T Bell Laboratories, a reputable institution known for its groundbreaking research and development in telecommunications and technology. His work has contributed significantly to advancements in optical lithography, which is critical for the production of semiconductors.

Collaborations

During his time at AT&T Bell Laboratories, Raab has collaborated with notable coworkers such as Sheila Vaidya and Donald L. White. These collaborations have undoubtedly enriched his research and contributed to the successful development of his patent.

Conclusion

Eric L. Raab exemplifies the spirit of innovation with his contributions to optical lithography through his patented technology. His work not only reflects his individual creativity and expertise but also the collaborative efforts within a renowned research environment. As advancements in the semiconductor industry continue to evolve, Raab's innovations play a vital role in shaping the future of technology.