Company Filing History:
Years Active: 2025
Title: Eon Seok Lee: Innovator in Position Measurement Technology.
Introduction
Eon Seok Lee is a prominent inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of position measurement technology. His innovative approach has led to the development of a unique patent that enhances the accuracy of position measurement in various applications.
Latest Patents
Eon Seok Lee holds a patent for a "Position Measuring Device and Substrate Processing Apparatus Including the Same." This invention provides a position measuring device and method that accurately measures the position of a movable member using multiple linear scales. The device consists of a first linear scale elongated in a first direction, a second linear scale also elongated in the first direction and separated from the first linear scale, and a head structure that includes a first scale head and a second scale head. These components work together to read the linear scales while moving in the first direction, with the scale heads being activated or deactivated in opposition to each other. This innovative design allows for precise measurements, which are crucial in various industrial applications.
Career Highlights
Eon Seok Lee has established himself as a key figure in the field of position measurement technology. His work at Semes Co., Ltd. has been instrumental in advancing the capabilities of measurement devices. With a focus on innovation, he continues to push the boundaries of technology in his field.
Collaborations
Eon Seok Lee collaborates with talented individuals such as Bo Ram Chan Sung and Dong Yun Lee. Their combined expertise contributes to the development of cutting-edge technologies in the industry.
Conclusion
Eon Seok Lee's contributions to position measurement technology exemplify the spirit of innovation. His patent and collaborative efforts highlight the importance of precision in industrial applications. Through his work, he continues to influence the field and inspire future advancements.