Company Filing History:
2 out of 21,598 
1 out of 40 
1 out of 41 Years Active: 2001-2011
Title: Emmanuel Lurie: Innovator in Radiation-Sensitive Compositions
Introduction
Emmanuel Lurie is a notable inventor based in Lod, IL. He has made significant contributions to the field of radiation-sensitive compositions, holding a total of 5 patents. His work has been instrumental in advancing technologies used in lithographic printing.
Latest Patents
One of Lurie's latest patents focuses on radiation-sensitive compositions and elements with solvent-resistant poly(vinyl acetal)s. This innovative composition is designed to prepare positive-working imageable elements that exhibit improved solvent resistance. It is particularly useful for creating lithographic printing plates. The composition includes an alkaline soluble polymeric binder, which is a specific poly(vinyl acetal) that demonstrates enhanced resistance to press chemicals, along with a radiation-absorbing compound.
Career Highlights
Throughout his career, Emmanuel Lurie has worked with prominent companies such as Eastman Kodak Company and Creo Il. Ltd. His experience in these organizations has allowed him to refine his expertise in the development of advanced materials and technologies.
Collaborations
Lurie has collaborated with several professionals in his field, including Moshe Levanon and Sergei Malikov. These partnerships have contributed to the success of his projects and innovations.
Conclusion
Emmanuel Lurie is a distinguished inventor whose work in radiation-sensitive compositions has had a lasting impact on the lithographic printing industry. His patents and collaborations reflect his commitment to innovation and excellence in his field.