Company Filing History:
Years Active: 2001-2008
Title: Emily E Fisch: Innovator in Semiconductor Technology
Introduction
Emily E Fisch is a prominent inventor based in Burlington, VT (US). She has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. Her innovative work has advanced processes that are crucial for the development of modern electronic devices.
Latest Patents
Among her latest patents is the "Etch apparatus," which describes a process using a hot phosphoric acid etchant to etch silicon nitride on a semiconductor wafer. This process involves establishing a recirculating path for the etchant, where a porous filter coated with silicon nitride is installed. As the etchant flows through the filter, the silicon nitride dissolves, enhancing the etch selectivity of the process. Monitoring the concentration of silicon nitride in the etchant stabilizes this selectivity, making the process more efficient.
Another notable patent is the "EUVL mask structure and method of formation." This patent outlines an extreme ultraviolet lithography mask structure that includes a first conductive layer between a buffer layer and an absorber layer. The design allows for the formation of a mask pattern in the absorber layer while addressing defects that may occur during the process. This innovation is essential for improving the quality and reliability of EUV lithography.
Career Highlights
Emily has worked with several esteemed organizations, including the International Business Machines Corporation (IBM). Her experience in such a leading company has provided her with a solid foundation in semiconductor research and development.
Collaborations
Throughout her career, Emily has collaborated with notable professionals in her field, including Arne Watson Ballantine and Ronald A Warren. These collaborations have contributed to her success and the advancement of her innovative projects.
Conclusion
Emily E Fisch is a remarkable inventor whose work in semiconductor technology has led to significant advancements in the industry. Her patents reflect her dedication to innovation and her impact on the field.