Kanagawa, Japan

Emi Ikeda

This inventor holds 1 USPTO granted patent. Top assignee: Sony Corporation. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Emi Ikeda. Retrieved from https://idiyas.com/inventor/emi-ikeda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Emi Ikeda: Innovator in Fluid Control Technology

Introduction

Emi Ikeda is a prominent inventor based in Kanagawa, Japan. She has made significant contributions to the field of fluid control technology, particularly in the development of devices that enhance the measurement of microparticles.

Latest Patents

Emi Ikeda holds a patent for a fluid control device, a microparticle measurement device, and a fluid control method. This innovative technology is designed to facilitate the smooth setting of sheath liquid. The fluid control device includes a support portion that supports a sheath liquid storage unit and a sealed portion that houses the support portion. The support portion is detachable from the sealed portion, which is controlled by pressurization to feed the sheath liquid stored in the storage unit to a microparticle measurement device.

Career Highlights

Emi Ikeda is currently employed at Sony Corporation, where she continues to work on cutting-edge technologies. Her expertise in fluid control systems has positioned her as a key player in her field.

Collaborations

Emi collaborates with notable colleagues, including Yoshitsugu Sakai and Ichiro Fujii, who contribute to her innovative projects and research.

Conclusion

Emi Ikeda's work in fluid control technology exemplifies her commitment to innovation and excellence. Her contributions are paving the way for advancements in microparticle measurement and fluid management systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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