Company Filing History:
Years Active: 2002
Title: **Elaine Pao: Innovating Ruthenium Deposition Techniques**
Introduction
Elaine Pao is a distinguished inventor based in Los Altos Hills, CA, known for her significant contributions to the field of chemical vapor deposition. With a total of two patents to her name, she has made remarkable advancements in the methods of forming ruthenium layers on substrates, which are crucial for a variety of electronic applications.
Latest Patents
Elaine's latest patents showcase her innovative prowess in the area of ruthenium deposition:
1. **CVD Ruthenium Seed for CVD Ruthenium Deposition** - This invention outlines a method for creating a ruthenium seed layer on a substrate. The process includes introducing a ruthenium-containing compound and oxygen into a CVD apparatus, maintaining an oxygen-rich environment to form an initial ruthenium oxide seed layer, and subsequently annealing it to create a ruthenium seed layer.
2. **Chemical Vapor Deposition of Ruthenium Films for Metal Electrode Applications** - In this patent, Elaine provides a method for depositing ruthenium films using liquid source chemical vapor deposition. Key aspects of this invention involve utilizing a source material that is liquid at room temperature and optimizing the deposition temperature to ensure effective film formation.
Career Highlights
Elaine Pao works at Applied Materials, Inc., where she focuses on the development of advanced deposition techniques. Her experience and expertise in chemical vapor deposition have positioned her at the forefront of innovations within the semiconductor manufacturing industry. Her patents reflect her deep understanding of material properties and deposition processes.
Collaborations
Throughout her career, Elaine has collaborated with several talented professionals, including Christopher Wade and Yaxin Wang. These collaborations have further fueled her innovative spirit and expanded the horizons of her research and development efforts in ruthenium film technologies.
Conclusion
Elaine Pao's contributions to the field of chemical vapor deposition, particularly with her advancements in ruthenium deposition techniques, underscore her role as a leading inventor in the materials science community. Her patents not only enhance the understanding of ruthenium applications but also pave the way for future innovations in electronic materials and devices.