Elaine G Kokinda

Title: Elaine G Kokinda: Innovator in Photoresist Technology

Introduction

Elaine G Kokinda is a notable inventor based in Somerville, NJ (US). She has made significant contributions to the field of photoresist technology, holding 2 patents that showcase her innovative spirit and technical expertise.

Latest Patents

Her latest patents include a positive photoresist composition containing a 2,4-dinitro-1-naphthol. This light-sensitive composition features a film-forming novolak resin, a quinone-diazide photoactive compound, a solvent, and a dye that enhances the resist pattern's linewidth variation on reflective substrates without compromising lithographic performance. Another patent focuses on an acidic ion exchange resin as a catalyst to synthesize novolak resins. This invention provides methods for producing water-insoluble, aqueous alkali-soluble novolak resins with consistent molecular weight and minimal metal ion levels, which are crucial for producing high-quality semiconductor devices.

Career Highlights

Elaine has worked with prominent companies such as Hoechst Celanese Corporation and Clariant Finance (BVI) Limited. Her experience in these organizations has allowed her to refine her skills and contribute to advancements in her field.

Collaborations

Throughout her career, Elaine has collaborated with talented individuals, including M Dalil Rahman and Daniel P Aubin. These partnerships have fostered innovation and the exchange of ideas in the realm of photoresist technology.

Conclusion

Elaine G Kokinda's contributions to the field of photoresist technology are significant and impactful. Her innovative patents and career achievements highlight her role as a leading inventor in this specialized area.