Company Filing History:
Years Active: 2001
Title: Eiji Kosaka: Innovator in Photosensitive Resin Technology
Introduction
Eiji Kosaka is a notable inventor based in Ogaki, Japan. He has made significant contributions to the field of photosensitive resin compositions, which are essential in various applications, including electronics and printing technologies. His innovative work has led to the development of a patented resin composition that enhances sensitivity and adhesion.
Latest Patents
Eiji Kosaka holds a patent for a photosensitive resin composition and a photosensitive element utilizing this composition. The invention aims to provide a photosensitive resin composition characterized by excellent sensitivity, adhesion, high resolution, and plating resistance. The composition includes a polymer with carboxyl groups, a compound with ethylene-based unsaturated groups, and a photopolymerization initiator. Notably, the compound contains at least 60 weight % of methacrylate, ensuring optimal performance in various applications.
Career Highlights
Kosaka is associated with Nichigo-Morton Co., Ltd., where he has been instrumental in advancing the company's research and development efforts in photosensitive materials. His expertise in polymer chemistry has positioned him as a key figure in the innovation of high-performance resin compositions.
Collaborations
Eiji Kosaka has collaborated with Shigeru Murakami, contributing to the development of advanced materials in their field. Their partnership has fostered innovation and has led to significant advancements in photosensitive technology.
Conclusion
Eiji Kosaka's contributions to the field of photosensitive resin compositions highlight his role as an innovator in material science. His patented work continues to influence various industries, showcasing the importance of innovation in technology.