Company Filing History:
Years Active: 2025
Title: Eiji Higurashi: Innovator in Plasma Technology
Introduction
Eiji Higurashi is a notable inventor based in Tsukuba, Japan. He has made significant contributions to the field of plasma technology, particularly in the development of efficient plasma sources. His work has implications for various advanced industrial applications.
Latest Patents
Higurashi holds a patent for a "Plasma source, and atomic clock employing plasma source." This invention features a small plasma source that enables highly efficient discharge in an ultra-high vacuum state. The design includes multiple magnets arranged strategically to optimize performance, along with electrodes that facilitate the discharge process. The patent outlines specific measurements to ensure the effectiveness of the plasma source, emphasizing its innovative approach to atomic clock technology. He has 1 patent to his name.
Career Highlights
Eiji Higurashi is affiliated with the National Institute of Advanced Industrial Science and Technology, where he conducts research and development in plasma technology. His work has been instrumental in advancing the understanding and application of plasma sources in various scientific fields.
Collaborations
Higurashi has collaborated with notable colleagues, including Yuuichi Kurashima and Taisei Motomura. Their combined expertise has contributed to the success of their projects and innovations in plasma technology.
Conclusion
Eiji Higurashi's contributions to plasma technology highlight his role as an innovator in the field. His patent for a plasma source demonstrates his commitment to advancing scientific research and industrial applications.