Edwin Goh

Title: Innovations by Edwin Goh in Integrated Circuit Technology

Introduction

Edwin Goh is a notable inventor based in Singapore, recognized for his contributions to the field of integrated circuits. With a total of two patents to his name, Goh has made significant strides in enhancing the performance and stability of electronic components.

Latest Patents

Goh's latest patents focus on an intermetal dielectric layer for integrated circuits. This innovative structure includes a premetal dielectric and a metal line, featuring a SRO liner on the premetal dielectric layer and the metal lines. Additionally, it incorporates a FGS dielectric layer over the SRO liner, a SRO film over the FGS dielectric layer, and a TEOS dielectric layer on top of the SRO film. The vias through the FGS dielectric layer are treated to have fluorine-free regions around them. This design effectively prevents fluorine attacks on the metal lines or vias while maintaining a stable FGS dielectric layer with reduced fluorine out-gassing and out-diffusion.

Career Highlights

Throughout his career, Edwin Goh has demonstrated a commitment to advancing technology in the semiconductor industry. His work has contributed to the development of more reliable and efficient integrated circuits, which are essential for modern electronic devices.

Collaborations

Goh has collaborated with talented individuals such as Huang Liu and John Leonard Sudijono, further enhancing the innovative environment in which he works.

Conclusion

Edwin Goh's contributions to integrated circuit technology through his patents reflect his expertise and dedication to innovation. His work continues to influence the field and pave the way for future advancements in electronics.