Endwell, NY, United States of America

Edward Cibulsky


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Edward Cibulsky: Innovator in Metal Surface Polishing Technology

Introduction

Edward Cibulsky is a notable inventor based in Endwell, NY (US). He has made significant contributions to the field of metal surface polishing technology. His innovative approach has led to the development of a unique method that enhances the manufacturing process of circuit boards.

Latest Patents

Cibulsky holds a patent for a "Method and apparatus for polishing metal surfaces." This invention provides a technique for chemically planarizing an exposed surface of metal on a substrate to a pre-determined thickness. The substrate typically features an exposed metal surface, such as copper circuitry on a dielectric substrate, which is to be planarized. The process involves rotating a planarizing head against the substrate while continuously supplying a chemical etchant that is free of abrasive material. This method ensures that the metal surface is polished to a precise thickness, forming a surface co-planar with the photoresist in circuit board manufacturing.

Career Highlights

Cibulsky is associated with the International Business Machines Corporation (IBM), where he has applied his expertise in developing advanced manufacturing techniques. His work has been instrumental in improving the efficiency and quality of circuit board production.

Collaborations

Cibulsky has collaborated with notable coworkers, including Gerald Andrew Kiballa and Voya Rista Markovich. Their combined efforts have contributed to advancements in the field of metal surface polishing.

Conclusion

Edward Cibulsky's innovative contributions to metal surface polishing technology have made a significant impact on the manufacturing industry. His patent and work at IBM exemplify the importance of innovation in enhancing production processes.

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