Hong Kong, China

Edmund Lam


 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2009-2016

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2 patents (USPTO):Explore Patents

Title: Innovations of Edmund Lam in Light-Field Imaging and Lithography

Introduction

Edmund Lam is a notable inventor based in Hong Kong, CN, recognized for his contributions to the fields of light-field imaging and optical lithography. With a total of 2 patents, Lam has developed innovative methods that enhance image processing and reduce manufacturing costs in circuit fabrication.

Latest Patents

One of Lam's latest patents is titled "Method and apparatus for processing light-field image." This invention provides a comprehensive method for acquiring and processing light-field images, which includes determining a cost function for offset estimation and reconstructing high-resolution light fields. The method effectively improves spatial resolution by utilizing optical flow change information.

Another significant patent is "Rectangular contact lithography for circuit performance improvement and manufacture cost reduction." This optical lithography method employs double exposure techniques to fabricate regularly-placed rectangular contacts in application-specific integrated circuits (ASICs). By using a reusable template mask and a trim mask, Lam's method enhances circuit performance while minimizing manufacturing costs and contact sizes.

Career Highlights

Edmund Lam has worked with prestigious organizations, including The University of Hong Kong and Huawei Technologies Co., Limited. His experience in these institutions has contributed to his expertise in developing cutting-edge technologies in imaging and lithography.

Collaborations

Throughout his career, Lam has collaborated with notable colleagues such as Jun Wang and Alfred K Wong. These partnerships have likely fostered innovation and the exchange of ideas in their respective fields.

Conclusion

Edmund Lam's innovative patents in light-field imaging and lithography demonstrate his significant impact on technology and manufacturing processes. His work continues to influence advancements in these areas, showcasing the importance of innovation in driving progress.

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