Company Filing History:
Years Active: 2025
Title: E-Ming Ho: Innovator in Photoresist Film Technology
Introduction
E-Ming Ho is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of photoresist films. His innovative work has led to the creation of a patented technology that enhances the performance of photoresist materials used in various applications.
Latest Patents
E-Ming Ho holds a patent for a photoresist film and its application. The patent describes a photoresist film characterized by a specific thickness, ranging from 60 μm to 600 μm. When analyzed using ultraviolet-visible spectroscopy, the film exhibits defined absorbance values at 405 nm and 436 nm, ensuring optimal performance in its intended applications. This innovation is crucial for advancements in photolithography and related technologies.
Career Highlights
E-Ming Ho is associated with Chang Chun Plastics Co., Ltd., where he has been instrumental in driving research and development efforts. His expertise in materials science has positioned him as a key figure in the company, contributing to its reputation for innovation in the plastics industry.
Collaborations
E-Ming Ho has collaborated with talented coworkers, including Zih-I Chuang and Yun-Jung Wu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the advancement of technology in their field.
Conclusion
E-Ming Ho's contributions to the development of photoresist films exemplify his commitment to innovation and excellence in materials science. His work not only enhances the capabilities of photoresist technology but also reflects the collaborative spirit of his team at Chang Chun Plastics Co., Ltd.