Company Filing History:
Years Active: 2021
Title: Dung Van Le: Innovator in Aircraft Wing Technology
Introduction
Dung Van Le is a notable inventor based in Saint-Laurent, Canada. He has made significant contributions to the field of aerospace engineering, particularly in the design of apparatuses that enhance aircraft performance. His innovative approach has led to the development of a patent that addresses critical issues in aircraft wing functionality.
Latest Patents
Dung Van Le holds a patent for an "Apparatus for obstructing air flow through an aperture for a duct in an aircraft wing." This invention is designed to obstruct air flow through an aperture in an aircraft wing where a movable anti-icing duct extends. The apparatus comprises a base member configured to be secured to the duct and a first seal member that obstructs air flow through the aperture. The first seal member features a proximal portion connected to the base member and a distal portion that movably contacts the inner surface of the wing's skin. This innovative design aims to reduce leakage flow from the high-pressure lower wing surface to the low-pressure upper wing surface, thereby minimizing lift loss associated with such leakage.
Career Highlights
Throughout his career, Dung Van Le has worked with prominent companies in the aerospace sector, including Airbus Canada Limited Partnership and C Series Aircraft Limited Partnership. His experience in these organizations has allowed him to apply his inventive skills to real-world challenges in aircraft design and functionality.
Collaborations
Dung Van Le has collaborated with notable professionals in the industry, including Daniel Gallien and Russell Coln Humphris. These collaborations have contributed to the advancement of aerospace technologies and innovations.
Conclusion
Dung Van Le's contributions to aircraft wing technology through his innovative patent demonstrate his commitment to enhancing aerospace engineering. His work continues to influence the industry and improve aircraft performance.