Company Filing History:
Years Active: 2006-2008
Title: Duc Chinh Tran: Innovator in Plasma-Based Radiation Technologies
Introduction
Duc Chinh Tran is a notable inventor based in Goettingen, Germany. He has made significant contributions to the field of plasma-based radiation technologies, particularly in the area of extreme ultraviolet (EUV) sources for semiconductor lithography. With a total of 2 patents, his work focuses on innovative methods to enhance the efficiency and longevity of radiation sources.
Latest Patents
Tran's latest patents include a "Method and arrangement for the suppression of debris in the generation of short-wavelength radiation based on a plasma." This invention addresses the challenge of suppressing debris from plasma sources, ensuring that optical components downstream are protected without compromising the desired radiation output. The method involves injecting a buffer gas within the debris filter structure, creating a controlled environment that minimizes particle flow while maintaining radiation quality.
Another significant patent is the "Arrangement for debris reduction in a radiation source based on a plasma." This invention aims to improve beam shaping and reduce debris in radiation sources, thereby extending the life of collector optics. By incorporating exchangeable additional optics in the radiation path, Tran's design enhances the effectiveness of debris reduction while preserving transparency and protective mechanisms.
Career Highlights
Duc Chinh Tran is currently employed at Xtreme Technologies GmbH, where he continues to develop cutting-edge technologies in the field of plasma-based radiation. His work is instrumental in advancing the capabilities of EUV sources, which are critical for modern semiconductor manufacturing.
Collaborations
Tran collaborates with esteemed colleagues such as Juergen Kleinschmidt and Jesko Brudermann. Their combined expertise contributes to the innovative projects at Xtreme Technologies GmbH, fostering a collaborative environment that drives technological advancements.
Conclusion
Duc Chinh Tran's contributions to plasma-based radiation technologies exemplify the impact of innovative thinking in the field. His patents not only address current challenges but also pave the way for future advancements in semiconductor lithography.
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