Location History:
- Nantou County, TW (2016)
- Tainan, TW (2014 - 2017)
Company Filing History:
Years Active: 2014-2017
Title: Duan-Chih Wang: Innovator in Photosensitive Resin Technology
Introduction
Duan-Chih Wang is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of photosensitive resin compositions, holding a total of 4 patents. His work focuses on developing materials that enhance the performance and durability of electronic devices.
Latest Patents
Wang's latest patents include innovative formulations of photosensitive resin compositions. One notable invention is a photosensitive resin composition that boasts high developability, excellent hardness, and strong sputtered resistance. This invention also outlines a method for manufacturing color filters and liquid crystal display devices. The composition consists of an alkali-soluble resin, a compound with ethylenically unsaturated groups, a photoinitiator, an organic solvent, a pigment, and an additional compound. Another patent details a similar photosensitive resin composition that includes a metal chelating agent, allowing for the formation of tightly adhered pixels to substrates without a prebake step.
Career Highlights
Duan-Chih Wang is currently employed at Chi Mei Corporation, where he continues to innovate in the field of materials science. His work has been instrumental in advancing technologies related to display devices and other electronic applications.
Collaborations
Wang collaborates with talented colleagues, including Jung-Pin Hsu and Bo-Hsuan Lin, to further enhance the development of photosensitive materials.
Conclusion
Duan-Chih Wang's contributions to the field of photosensitive resin technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material science and its applications in modern technology.