Doyon Chang

Title: Doyon Chang: Innovator in Electroplating Technology

Introduction

Doyon Chang is a notable inventor based in Changwon-shi, South Korea. He has made significant contributions to the field of electroplating technology, particularly in the preparation of nickel (Ni) layers with biaxial texture. His innovative work is expected to advance the development of thin film materials.

Latest Patents

Doyon Chang holds a patent for an "Electroplating process for preparing a Ni layer of biaxial texture." This patent discloses a method for forming an Ni-plated layer characterized by specific misorientation parameters. The peaks measured on a θ-rocking curve have a full width at half maximum (FWHM) of 7° or less, while peaks measured on a φ-scan have a FWHM of 21° or less. The process involves electroplating under a magnetic field and subsequent thermal treatment to enhance the biaxial texture. This innovation is poised to replace traditional vacuum deposition methods used in the preparation of thin film magnetic and piezoelectric materials.

Career Highlights

Doyon Chang is affiliated with the Korea Institute of Machinery and Materials, where he continues to explore advancements in electroplating technology. His work has garnered attention for its potential applications in various industries, including electronics and materials science.

Collaborations

Doyon Chang has collaborated with esteemed colleagues such as Kyu Hwan Lee and Hyung-Sik Chung. Their joint efforts contribute to the ongoing research and development in the field of electroplating.

Conclusion

Doyon Chang's innovative contributions to electroplating technology highlight his role as a key inventor in the field. His patent for the electroplating process is expected to have a lasting impact on the development of thin film materials.