Location History:
- Denver, CO (US) (1998 - 2000)
- Medford, MA (US) (2002)
- Billerica, MA (US) (2004)
Company Filing History:
Years Active: 1998-2004
Title: Douglas L. Schulz: Innovator in Thin-Film Conductors and Metallic Nanoparticles
Introduction
Douglas L. Schulz is a notable inventor based in Billerica, MA (US), recognized for his contributions to the field of electrical conductors and metallic nanoparticles. He holds a total of 4 patents, showcasing his innovative approach to solving complex problems in material science.
Latest Patents
One of his latest patents is titled "Direct printing of thin-film conductors using metal-chelate inks." This process involves forming an electrical conductor on a substrate by utilizing an ink comprised of a metallic chelate. The method includes printing the ink directly onto the substrate and subsequently decomposing it to convert the metal-chelate into a solid metal conductor. Another significant patent is "Passivating etchants for metallic particles." This invention provides a process for etching corrosion layers from metallic nanoparticles while simultaneously forming a passivating layer. The method involves preparing a reaction mixture with sodium hexafluoroacetylacetonate and metallic particle powder, allowing for improved electrical properties of the contact.
Career Highlights
Douglas L. Schulz has made significant strides in his career, particularly through his work at the Midwest Research Institute. His innovative patents reflect his dedication to advancing technology in the field of electrical conductors and nanoparticles.
Collaborations
Throughout his career, Schulz has collaborated with esteemed colleagues, including Calvin J. Curtis and David Samuel Ginley. These partnerships have contributed to the development of his groundbreaking inventions.
Conclusion
Douglas L. Schulz stands out as a prominent inventor whose work in thin-film conductors and metallic nanoparticles has made a lasting impact on the field. His innovative patents and collaborations highlight his commitment to advancing technology and improving electrical properties in various applications.