Location History:
- Austin, TX (US) (1999)
- Scottsdale, AZ (US) (2007)
Company Filing History:
Years Active: 1999-2007
Title: Innovations by Douglas John Downey
Introduction
Douglas John Downey is an accomplished inventor based in Austin, TX, known for his significant contributions to semiconductor fabrication. He holds two patents that showcase his expertise in controlling critical dimensions during the manufacturing process.
Latest Patents
One of his latest patents is a run-to-run control process for controlling critical dimensions. This innovative method compensates for all causes of critical dimension variation by adjusting the time of photoresist etch. The control system employs photoresist etch time as a manipulated variable in either a feedforward or feedback control configuration. By implementing this control method, Downey has achieved numerous advantages, including reduced lot-to-lot variation, increased yield, and enhanced speed of fabricated circuits. His work particularly benefits polysilicon gate critical dimension control in microprocessor circuits, where linewidth variability is minimized. The run-to-run control technique allows for adjustments based on wafer tests or measurements, ensuring that critical dimensions meet defined specifications.
Career Highlights
Douglas Downey has made a notable impact in the field of semiconductor technology through his innovative approaches. His work at Advanced Micro Devices Corporation has positioned him as a key player in the industry, contributing to advancements in integrated circuit manufacturing.
Collaborations
He has collaborated with esteemed colleagues such as Anthony John Toprac and Subhash Gupta, further enhancing the innovative environment in which he works.
Conclusion
Douglas John Downey's contributions to semiconductor fabrication through his patents and collaborative efforts highlight his role as a leading inventor in the field. His innovative methods continue to drive advancements in technology and improve manufacturing processes.