Location History:
- Essex Junction, VT (US) (2000 - 2001)
- South Burlington, VT (US) (2002 - 2003)
Company Filing History:
3 out of 164,108 
1 out of 832,680 Years Active: 2000-2003
Title: Innovations of Douglas E Benoit
Introduction
Douglas E Benoit is a notable inventor based in South Burlington, Vermont. He has made significant contributions to the field of lithography, particularly in the development of advanced x-ray masks. With a total of four patents to his name, Benoit has demonstrated a commitment to innovation and technological advancement.
Latest Patents
One of Benoit's latest patents is titled "Pattern density tailoring for etching of advanced lithographic masks." This patent describes a method of preparing an x-ray mask that involves several intricate steps. The process begins with providing a substrate and applying an etch stop layer that is resistant to etchant for an x-ray absorber. Following this, an x-ray absorber layer is applied. The method includes removing a portion of the substrate below these layers to create an active region above the removed portion and an inactive region over the remaining substrate. A resist layer is then applied above the absorber layer, which is exposed using electron beam irradiation. This exposure allows for the development of a latent mask image over the active region. The exposed portion of the resist layer is removed, leaving a mask image that is then used to etch the absorber layer, ultimately forming an x-ray mask on the substrate.
Career Highlights
Throughout his career, Douglas E Benoit has worked with prominent companies, including the International Business Machines Corporation (IBM). His experience in such a reputable organization has undoubtedly contributed to his expertise and innovative capabilities in the field of lithography.
Collaborations
Benoit has collaborated with several professionals in his field, including Maheswaran Surendra and Cameron James Brooks. These collaborations have likely enriched his work and led to further advancements in his projects.
Conclusion
Douglas E Benoit is a distinguished inventor whose work in lithography has led to significant advancements in the preparation of x-ray masks. His innovative methods and collaborations highlight his contributions to the field and the impact of his inventions.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.