Doug Van Broeke

Title: Doug Van Broeke: Innovator in Microlithography

Introduction

Doug Van Broeke is a notable inventor based in Sunnyvale, CA (US). He has made significant contributions to the field of microlithography, particularly through his innovative patent. His work focuses on enhancing the precision of imaging techniques used in various applications.

Latest Patents

Doug Van Broeke holds a patent titled "Use of intersecting subresolution features for microlithography." This patent describes a method for creating an image on an image plane utilizing a photomask comprised of a plurality of intersecting subresolution features. The energy created by an energy source is projected through these subresolution features, which diffract the light to produce constructive or positive interference. This process results in an image being formed on the image plane that differs from the image or pattern of subresolution features on the photomask. Doug has 1 patent to his name.

Career Highlights

Throughout his career, Doug has demonstrated a commitment to advancing technology in the field of microlithography. His innovative approach has led to improved methods for image formation, which are crucial in various technological applications.

Collaborations

Doug has worked alongside his coworker, Fung Bor Chen, contributing to the development of cutting-edge technologies in their field.

Conclusion

Doug Van Broeke's contributions to microlithography through his innovative patent highlight his role as a significant inventor in the industry. His work continues to influence advancements in imaging technology.